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Sputter
Deposition Systems In-Line Systems w/Load Lock Options - Vertical (Arrow Series) - Horizontal (Arrow or Axis Series) Batch Systems w/Load Lock Options - Vertical (SS Series) - Horizontal (VS Series) Drum Coaters NEW! High Density PLASMA System > Evaporation Systems Box Coaters (Orion System) Bell Jar Systems Load-Lock Systems
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Web Coaters |
CHA FixturingSpherical domed planetary substrate holderThe substrate holder revolves while it also rides around a center giving an epicycle motion to each substrate. This fixturing is domed presenting a large surface area for substrates to accommodate more parts for the same chamber diameter. Coating is uniform across the three domes considering the directional properties of emission of the virtual source.
Rotating dome substrate holderA rotating dome enables efficient use of the available coating area. The dome rotates about a vertical axis at the calculated distance from the virtual source.
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ComponentsMRC Parts
Chi Mu Upsilon Conversions
MRC INSET TargetHigh uniformityFor Aluminum, MRC guarantees ±5% film uniformity across a pallet of substrates and ±5% batch-to-batch. Production users of INSET targets report uniformities of ±3% within a single batch of substrates and from batch-to-batch. High Deposition RatesElectron capture shields surrounding the INSET cathode permit higher deposition rates with less heating of the substrates. The 903 takes advantage of this high deposition rate to achieve its high thruput. High UtilizationChi, Mu, Upsilon INSET targets achieve a material utilization of more than 50% and are available for most metallization applications. Ease of InstallationThe INSET targets can be changed by simply removing a series of clamping bolts. Most importantly, the targets require no backing plates or rebonding. As a result, INSET targets are the easiest, least expensive targets in the industry to install. Categories of parts on hand
PLC Screen for Vacuum Deposition
All systems feature:
Options may include:
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