 |
||
 |
 |
|
|
>
Sputter
Deposition Systems In-Line Systems w/Load Lock Options - Vertical (Arrow Series) - Horizontal (Arrow or Axis Series) Batch Systems w/Load Lock Options - Vertical (SS Series) - Horizontal (VS Series) Drum Coaters NEW! High Density PLASMA System > Evaporation Systems Box Coaters (Orion System) Bell Jar Systems Load-Lock Systems
>
Web Coaters
|
Orion High Vacuum Evaporator
The Orion series evaporator is a versatile system which can be used for high production, pilot production or research and development for optical, semiconductor and special applications where multiple devices are required. The size of the box chamber ranges from 27" to 48", and can be offered in a through-the-wall configuration. It is a high performance system which utilizes widely available, long lasting, best-of-breed components. As a company with a great deal of high vacuum expertise, we continue to develop new designs and improve the previous ones. We identify the best features in competing products and integrate them into ours.
An SCT exclusive is the short, straight through, conductance path which exposes less surface area to the vacuum. All high vacuum components, including the cryopump are fabricated from electropolished type 304 stainless steel, sealed with a minimum number of Viton o-rings and gaskets. All rotary seals are of the ferrofluidic type. Air operated and electrically controlled automatic valve sequencing interlocked with the vacuum system controller ensures ease of operation and protection against normal operating hazards. This control includes automatic regeneration of the cryopump. The Orion series houses as many as three electron beam sources and can include other types of resistance sources. Substrate fixtures include a canted dome high speed planetary system. Also available is a 90˚ angle of incidence lift-off fixture. Horizontal planetary and rotating flat plate fixtures are also available. All fixtures come with variable speed drive motors. The system can be equipped with the following power supplies: 3 or 6kW for dielectric type materials and 6, 10 or 15kW for highly conductive materials. We offer as options substrate heat, various thin film deposition controllers and glow discharge or ion beam substrate cleaning. Programmable High Vacuum System Controller with Data Logging CapabilitiesSCT provides a standard a PLC industrial controller. This system includes ladder logic software with required programming for the SCT Orion. The operator/engineer computer interface includes a touch screen display, HMI, and any software programming. The control system also performs data logging of all key process variables. Deposition SourcesMultiple resistance sources or three 270˚ deflection single or multi-crucible electron beam sources may be installed for single, sequential or co-deposition purposes. Each source can be provided with a quick acting shutter. Quartz crystal rate and thickness monitors can be tailored to exact requirements and coordinated with the sources. Substrate FixturingThe Orion will accept high speed canted dome planetary systems, 90˚ angle of incidence lift-off domes, rotating horizontal plates, and static fixturing. The movement of the canted dome planetary system assures optimum uniformity and step coverage for evaporated films. The rotating 90˚ angle of incidence lift-off dome ensures that the evaporated material hits the substrate at the 90˚ angle essential for the lift-off process. Uniformity masks can be provided for all fixturing to optimize deposition uniformity. Because of the ferrofluidic rotary drive, no leakage of contaminants can occur into the system, even during extended production runs. Positive positioning of each substrate fixture guarantees source to substrate geometry for reproducible films. Custom FeaturesAll of SCT’s systems are built to customer specifications, making each system unique. Our engineering department can make any desired modifications to the basic design so that we can provide you with a fully documented custom system tailored to your specific requirements. |
Orion SpecificationsChamber ConstructionAll internal surfaces are electropolished 304 stainless steel. The process chamber consists of a same-sided box with dimensions ranging from 27” to 48”. Frame and Cabinet A variety of optional electron beam source combinations and resistance sources are available upon request. Source tray mounted and fully shielded. Substrate Fixturing Multi-layer, multi-process controller. It can support up to eight single head, four dual head sensors, or one six sensor turret head. Power Supply GE Fanuc PLC with data logging capabilities. High Vacuum Pump Size commensurate with chamber volume. High Vacuum Pump Isolation Valve Stainless steel electropneumatically actuated high vacuum bellows sealed right angle valve. Vent Valve Two 4” view ports with manual shutters to minimize coating of the viewing surface. Located in upper and lower chamber. Air 208 VAC, 3 phase, five wire, 60 Hz, 60 Amps and 380/440 volts, 50Hz available. A separate supply is required for each electron beam power supply. Other voltages also available. Water 60 psig.
|
| © 2005 System Control Technologies | ||
