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These high performance systems utilize carefully selected materials and proven design geometries for the high vacuum components - stainless steel gate valve, piping, belljar and cryopump. These components eliminate many sources of contamination which limit the performance of other systems.

An SCT exclusive is the short, straight through  conductance path which exposes less surface area to the vacuum. All high vacuum components, including the cryopump are fabricated from electropolished type 304 stainless steel, sealed with a minimum number of Viton o-rings and gaskets. All rotary seals are of the ferrofluidic type.

Air operated and electrically controlled automatic valve sequencing interlocked with the vacuum system controller ensures ease of operation and protection against normal operating hazards. This control includes automatic regeneration of the cryopump.

The ES-26C houses as many as three electron beam sources and can include other types of resistance sources. Substrate fixtures include: A canted dome high speed planetary system with a capacity of 144-2", 75-3", and 42-4" diameter substrates. Also available is a 90˚ angle of incidence lift-off fixture with a capacity of 91-2", 42-3" and 22-4" diameter substrates. Horizontal planetary and rotating flat plate fixtures are also available. All fixtures come with variable speed drive motors.

The system can be equipped with the following power supplies: 3 or 6KW for dielectric type materials and 6, 8, 10 or 15KW for highly conductive materials.

We offer as options, substrate heat, thin film deposition controllers and glow discharge or ion beam substrate cleaning.

Programmable Vacuum System Controller with Data Logging Capabilities
SCT provides a standard PLC industrial controller. This system includes ladder logic software with any custom programming. The operator/engineer computer interface includes a touch screen display and any custom software programming. The control system also performs data logging of all key process variables.

Deposition Sources

Multiple resistance sources or three 270˚ deflection single or multi-crucible electron beam sources may be installed for single, sequential or co-deposition purposes. Each source can be provided with a quick acting shutter. Quartz crystal rate and thickness monitors can be tailored to exact requirements and coordinated with the sources.

Substrate Fixturing

The ES-26C will accept high speed canted dome planetary systems, 90˚ angle of incidence lift-off domes, rotating horizontal plates, and static fixturing. The movement of the canted dome planetary system assures optimum uniformity and step coverage for evaporated films. The rotating 90˚ angle of incidence lift-off dome ensures that the evaporated material hits the substrate at the 90˚ angle essential for the lift-off process.

Uniformity masks can be provided for all fixturing to optimize deposition uniformity. Because of the ferrofluidic rotary drive, no leakage of contaminants can occur into the system, even during extended production runs. Positive positioning of each substrate fixture guarantees source to substrate geometry for reproducible films.

Shutters

Efficient shutter systems protect the substrates and system from unwanted deposition. The shutters are mounted immediately aboue the sources and rotate via a Ferrofluidic feedthrough clear of the source to allow evaporation onto the substrates.

Model ES-26C Specifications

Chamber Construction
All internal surfaces are electropolished 304 stainless steel. The process chamber consists of a 26" wide and 26" deep by 25" tall box.

Frame and Cabinet
Welded steel tube frame; adjustable feet; formed steel panels;  hinged front and rear doors; side panels hung with magnetic retainers, baked, textured enamel finish.

Electron Beam Sources
A variety of optional electron beam source combinations and resistance sources are available upon request. Source tray mounted and fully shielded.

Substrate Fixturing
High speed canted dome planetary system. 90˚ angle of incidence liftoff dome. Custom fixturing available.

Quartz Crystal Deposition Controller
It can support up to eight single head or dual head sensors, or one six sensor turret head.

Power Supply
3,4,6,8,10,15kW available.

System/Gauge/Valve Controller
PLC with data logging capabilities.

High Vacuum Pump
Cryopump for clean, high speed pumping. Pumping speed: 4000 L/S water; 1500 L/S air.

Roughing Pump
26 or 35 CFM

High Vacuum Pump Isolation Valve
Electropneumatically actuated 7.75" stainless steel gate valve isolates the high vacuum pump from the process chamber.

Roughing Valve
Stainless steel electropneumatically actuated high vacuum bellows sealed 1.5" right angle valve.

Vent Valve
Stainless steel right angle valve; .25" diameter; electropneumatically actuated.

Viewing Ports
Two 4” view ports with manual shutters to minimize coating of the viewing surface. Located in upper and lower chamber.

Overall Dimensions
72" high x 72" wide x 30" deep.

Air
5 CFM at 70-100 PSIG

Power
208 VAC, 3 phase, five wire, 60 Hz, 40 Amps. A separate supply is required for each electron beam power supply; 208 VAC, 5 wire, 60 Hz, 70 Amps. Other voltages also available.

Custom Configurations Available